Manufacturing

«EMCORE» installation for MOCVD growth of laser heterostructures

2″ — substrate rotation holder
High homogeneity
Growth of thin layers

Post-growth process: Photolithography installation

2″ wafer processing
Mesastripe photomask formation

Post-growth process: Dry ion-plasma etching

Mesastripe formation
Vertical sidewalls
Precise etching depth

Post-growth process: Coating deposition on laser diode facets

Magnetron sputtering
Layer thickness control
Antireflection/Highreflection coating

Post-growth process: Laser diode mounting and packaging

Die bonding
Precise chip position
Wire bonding

Test and measurement of laser diode output parameters

L-I, V-I characteristics
Beam divergence
Emitting spectra