«EMCORE» installation for MOCVD growth of laser heterostructures manufacturing cycle
2″ — substrate rotation holder
High homogeneity
Growth of thin layers
Post-growth process: Photolithography installation
2″ wafer processing
Mesastripe photomask formation
Post-growth process: Dry ion-plasma etching
Mesastripe formation
Vertical sidewalls
Precise etching depth
Post-growth process: Coating deposition on laser diode facets
Magnetron sputtering
Layer thickness control
Antireflection/Highreflection coating
Post-growth process: Laser diode mounting and packaging
Die bonding
Precise chip position
Wire bonding
Test and measurement of laser diode output parameters
L-I, V-I characteristics
Beam divergence
Emitting spectra