Our Manufacture
«EMCORE» installation for MOCVD growth of laser heterostructures manufacturing cycle
- 2″ — substrate rotation holder
- High homogeneity
- Growth of thin layers
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Post-growth process: Photolithography installation
- 2″ wafer processing
- Mesastripe photomask formation
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Post-growth process: Dry ion-plasma etching
- Mesastripe formation
- Vertical sidewalls
- Precise etching depth
Post-growth process: Coating deposition on laser diode facets
- Magnetron sputtering
- Layer thickness control
- Antireflection/Highreflection coating
Post-growth process: Laser diode mounting and packaging
- Die bonding
- Precise chip position
- Wire bonding
Test and measurement of laser diode output parameters
- L-I, V-I characteristics
- Beam divergence
- Emitting spectra